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• W2019916627 abstract "A new technique for metalorganic chemical vapor deposition (MOCVD) using a very low deposition pressure (⩽ 1 Torr) has been developed for rapid deposition of superconducting YBa2Cu3O7−x (YBCO) films. A low deposition pressure not only raises the vaporization rate of organic sources but also stabilizes their sublimation characteristics, especially to Ba(thd)2. At a substrate temperature of 800°C, a high growth rate of 20 μm/h can be obtained on (100) SrTiO3 substrates. The transport Jc (0 T, 77 K) values of these 1–2 urn thick films reached 8.0× 105A/cm2 with Tc,0> 90 K." @default.
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• W2019916627 date "1992-09-01" @default.
• W2019916627 modified "2023-09-27" @default.
• W2019916627 title "In-situ growth of high-TcYBa2Cu3O7−x films at high deposition rate by low-pressure MOCVD" @default.
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• W2019916627 doi "https://doi.org/10.1016/0167-577x(92)90031-e" @default.
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