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- W2019928379 abstract "Abstract To improve microwave performance of GaAs MESFETs, shortening of the gate length is most effective. Here the influence of gate length shortening on the d.c. performance of ion implanted GaAs MESFETs was investigated. MESFETs with various gate lengths patterned by direct e-beam lithography (down to 0.25 μm) were prepared. The presence of short-channel effects is discussed." @default.
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- W2019928379 date "1990-10-01" @default.
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- W2019928379 title "d.c. Performance of short-channel ion-implanted GaAs MESFETs (The role of gate length shortening)" @default.
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- W2019928379 doi "https://doi.org/10.1016/0038-1101(90)90024-9" @default.
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