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- W2019931673 abstract "A low temperature ion source has been developed to produce a plasma with a low ion temperature and a high plasma density by using a gas contact technique. This ion source is a hybrid type consisting of modified plasma compression type cylindrical hollow cathode plasma source and the gas contact chamber with floating potential mounted on the head of the anode. The temperature of ions and the density in the produced argon plasma are gradually increased in order to compress it by the small canal of the floating electrode and the gas magnetic field. This plasma flow goes into the gas contact chamber and mixes with the cold neutral argon gas, resulting in the production of a low ion-temperature plasma by ion-neutral collisions. The characteristics of the energy distribution of extracted ion beam (Vex=500 V) were measured by an electrostatics analyzer and we determined both the half-value of the energy spread of ion beam ΔE and the mean ion temperature Ti in the plasma flow. The mean electron temperature Te and plasma density ne were determined by means of a plane Langmuir probe. As a result, Te and ΔE decrease from 4.1 to 2.5 eV and 13.3 to 8.3 eV, respectively, though ne is nearly constant at 3.0×1010 cm−3." @default.
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- W2019931673 date "1994-04-01" @default.
- W2019931673 modified "2023-09-27" @default.
- W2019931673 title "Low temperature ion source" @default.
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- W2019931673 doi "https://doi.org/10.1063/1.1144961" @default.
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