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- W2019935414 abstract "A microfabrication technique has been developed that combines the precision of silicon micromachining and fiber optics to allow the construction of large three-dimensional structures with dimensional tolerances approaching 1 μm [A. D. Feinerman, S. E. Shoaf, and D. A. Crewe, Proceedings of the 180th Annual ECS Conference, Phoenix, AZ, October 1991 (unpublished)]. A miniature scanning electron microscope (MSEM) is being designed using this method. In this article we will present the electron optic calculations of a simple 1 kV MSEM consisting of a source, a three element electrostatic lens, deflectors, and a detector. The MSEM measures less than one cubic centimeter. There are many advantages of a MSEM. The performance of a SEM is improved as its length is reduced. [T. H. P. Chang, D. P. Kern, and L. P. Murray, J. Vac. Sci. Technol. B 8, 1698 (1990)]. The need for mechanical adjustments and motion feedthroughs is eliminated since the microscope components are prealigned to the optic axis. All components are ultrahigh vacuum compatible and can be heated to 500 °C. A small, portable electron microscope can be brought to the sample to be inspected instead of the sample being brought to the microscope. Vacuum hardware requirements are minimized. The fabrication technology is inexpensive compared to the conventional methods of electron microscope construction. Our construction method is easily extended to permit arrays of MSEMs to allow applications in high throughput e-beam lithography and wafer inspection." @default.
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- W2019935414 title "Micromachined electrostatic electron source" @default.
- W2019935414 doi "https://doi.org/10.1116/1.585996" @default.
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