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- W2019955348 abstract "A simple alternative was studied for the tri-layer resist system. One single thick layer of resist polymer was surface silylated to obtain a bilevel structure that functioned similarly to the bilayer resist composed of the Si-containing top imaging and the bottom planalizing layers. A resist or matrix polymer layer containing phenolic – OH groups was silylated by exposing it to hexamethyldisilazane vapor, and Si atoms were effectively incorporated in the surface sublayer by limited gas permeation and reaction with the – OH groups. Oxygen RIE durability of the silylated poly(vinyl phenol) or the positive-working commercial EB resist, RE-5000P, was > 10 times as high as that of PVP or RE-5000P before silylation. The surface silylated single-layer (SSS) resist derived from RE-5000P was flood-exposed through a mesh mask to 11.7°C/cm2 of 4 KeV electrons, developed with tetramethylammonium hydroxide in aqueous methanol, and plasma-developed in an O2 RIE chamber to form a positive-tone relief image." @default.
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- W2019955348 date "1992-10-01" @default.
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- W2019955348 title "A surface silylated single-layer resist based on limited gas permeation" @default.
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- W2019955348 doi "https://doi.org/10.1002/pen.760322017" @default.
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