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- W2019975213 abstract "We have investigated new materials for 157nm attenuated phase-shifting mask (Att-PSM). The structure of the Att-PSM is based on the bi-layer film in which a transparent film (TF) is deposited on an absorptive film (AF) on quartz substrate. We evaluated the optical property and the durability against F2 laser irradiation for 157nm Att-PSM materials, for which we prepared the modified ZrSixOy films and SiOx film as a TF and the Cr film and the modified ZrSixOy films as an AF. For a TF, the SiOx and modified ZrSixOy films achieve high transparency and robust durability against F2 laser light. For an AF, the Cr film achieves robust irradiation durability. Furthermore, we investigated the feasibility of defect inspection in consideration of the various combinations of TF and AF. From the calculation of the transmittance at inspection wavelength (193nm and 248nm), it is expected that the defect inspection is feasible in the combination of the SiOx or ZrSixOy transparent films with any absorptive film." @default.
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- W2019975213 date "2001-01-22" @default.
- W2019975213 modified "2023-09-23" @default.
- W2019975213 title "Materials for an attenuated phase-shifting mask in 157-nm lithography" @default.
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- W2019975213 doi "https://doi.org/10.1117/12.410703" @default.
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