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- W2019984390 abstract "Abstract The periodic trench patterning of sapphire substrates is useful for the growth of crack‐free AlN thick films. However, the in‐plane epitaxial relationship between AlN and a‐plane sapphire depends on the initial growth temperature. Therefore, two trench directions, the <0001> a‐plane sapphire and <1‐100> a‐plane sapphire directions are investigated in this study. We investigated the control of in‐plane epitaxial relationship between AlN and a‐plane sapphire by low‐pressure HVPE and the effect of the trench direction of AlN, which results in two different in‐plane epitaxial relationships on a‐plane sapphire (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)" @default.
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- W2019984390 date "2012-02-29" @default.
- W2019984390 modified "2023-09-24" @default.
- W2019984390 title "Fabrication of crack‐free thick AlN film on a‐plane sapphire by low‐pressure HVPE" @default.
- W2019984390 doi "https://doi.org/10.1002/pssc.201100797" @default.
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