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• W2020001809 abstract "Block copolymer lithography makes use of the self-assembling properties of block copolymers to pattern nanoscale features over large areas. Although the resulting patterns have good short-range order, the lack of long-range order limits their utility in some applications. This work presents a lithographically assisted self-assembly method that allows ordered arrays of nanostructures to be formed by spin casting a block copolymer over surfaces patterned with shallow grooves. The ordered block copolymer domain patterns are then transferred into an underlying silica film using a single etching step to create a well-ordered hierarchical structure consisting of arrays of silica pillars with 20 nm feature sizes and aspect ratios greater than 3." @default.
• W2020001809 created "2016-06-24" @default.
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• W2020001809 date "2002-11-04" @default.
• W2020001809 modified "2023-10-09" @default.
• W2020001809 title "Fabrication of nanostructures with long-range order using block copolymer lithography" @default.
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• W2020001809 doi "https://doi.org/10.1063/1.1519356" @default.
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