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- W2020006057 abstract "Self-assembled Ge islands were grown on Si(100) substrate by Si2H6-Ge molecular beam epitaxy. After being subjected to chemical etching, it is found that the photoluminescence from the etched Ge islands became more intense and shifted to the higher-energy side compared to that of the as-deposited Ge islands. This behaviour was explained by the effect of chemical etching on the morphology of the Ge islands. Our results demonstrate that chemical etching can be a way to change the luminescence property of the as-deposited islands." @default.
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- W2020006057 date "2001-09-25" @default.
- W2020006057 modified "2023-09-27" @default.
- W2020006057 title "Increasing the photoluminescence intensity of Ge islands by chemical etching" @default.
- W2020006057 doi "https://doi.org/10.1088/1009-1963/10/10/315" @default.
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