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- W2020024784 abstract "Abstract A combination of experimental techniques: high-resolution X-ray diffraction (HXRD), high-resolution cross-sectional electron microscopy (HREM), X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) were employed to elucidate the interfacial microstructure in Si-on-sapphire system. The observed structural features and their role in the strain relieving mechanism at the interface are discussed. Chemical analysis shows that to some extent bonds like in aluminosilicates and SiO 2 are formed in the interfacial layer." @default.
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- W2020024784 title "Interfacial microstructure in Si-on-sapphire heterostructure" @default.
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- W2020024784 doi "https://doi.org/10.1016/s0022-0248(99)00216-x" @default.
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