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• W2020073229 abstract "Capacitor performance of amorphous PrTi x O y dielectric films deposited on TiN x metal electrodes to form MIM structures with Al top electrodes is demonstrated for the first time. The PrTi x O y capacitors were fabricated within the temperature budget of back end processes. Preliminary data on the composition of the dielectric layers and the interaction of water with the films was obtained by X-ray photoelectron spectroscopy (XPS). The I(V) and C(V) device characteristics are discussed." @default.
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• W2020073229 date "2005-06-01" @default.
• W2020073229 modified "2023-09-26" @default.
• W2020073229 title "MIM capacitors using amorphous high-k PrTixOy dielectrics" @default.
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• W2020073229 doi "https://doi.org/10.1016/j.mee.2005.04.018" @default.
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