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- W2020136324 abstract "Al films were prepared by DC magnetron sputter deposition at different substrate temperatures. The sheet resistance of the films was measured by four point probe sheet resistance meter, and the film thickness, which was obtained by surface profiling system. The surface and cross-section morphology of the films was observed by AFM and FESEM. As a result, the resistivity of the films decreases obviously as the substrate temperature increases gradually. The higher substrate temperature is, the rougher the films surface is and the larger the grain size is." @default.
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- W2020136324 date "2013-02-01" @default.
- W2020136324 modified "2023-09-27" @default.
- W2020136324 title "Properties of Al Films Depend on Substrate Temperature by DC Magnetron Sputter Deposition" @default.
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- W2020136324 doi "https://doi.org/10.4028/www.scientific.net/amr.662.413" @default.
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