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- W2020345731 abstract "Both ion implantation and silicidation have become standard processing steps in the fabrication of ULSI devices. As the device dimensions scale down to deep submicron region, it is essential to understand the interactions of metal contacts with highly doped shallow junctions. In this paper, issues in metal contacts on shallow junctions such as formation of silicides, growth of epitaxial silicides, stability of silicides as well as the removal of projected range and end of range defects are highlighted. Recent developments in the investigation of the formation of TiSi2 on shallow junctions formed with N+ implantation are presented." @default.
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- W2020345731 title "Metal contacts on shallow junctions" @default.
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- W2020345731 doi "https://doi.org/10.1016/s0168-583x(96)00582-4" @default.
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