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- W2020478749 abstract "Traditional implant layers are becoming increasingly complex in design and continuously pushing resolution limits lower. In response, developer-soluble bottom anti-reflective coatings (DBARCs) were introduced to meet these more challenging requirements. These DBARCs excelled over the traditional combination of single-layer resist and dyed resist/top anti-reflective coating (TARC). DBARCs offered the resolution and critical dimension (CD) control needed for the increasingly critical implant layers. Lithographic performance, focusing on CD control over topography and through-pitch behavior, demonstrated the inherent benefit of the DBARCs over the alternative solutions. Small-space residue testing showed the benefit of photosensitive (PS) DBARCs for cleanout of sub-100 nm trenches. A study of improved post-develop residue in various ion-implantation processes validated the use of new DBARC materials in implant layers." @default.
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- W2020478749 date "2011-03-17" @default.
- W2020478749 modified "2023-09-23" @default.
- W2020478749 title "Implementation of KrF DBARCs for implant applications on advanced lithography nodes" @default.
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- W2020478749 doi "https://doi.org/10.1117/12.879464" @default.
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