Matches in SemOpenAlex for { <https://semopenalex.org/work/W2020512676> ?p ?o ?g. }
Showing items 1 to 58 of
58
with 100 items per page.
- W2020512676 abstract "Geometry of x-ray point source proximity printing. Part 1. Linewidth control.Peter A. HollandaDynamic Automated Systems, Inc.,Westwood, MA 02090ABSTRACTIn this paper the relationship between exposure geometry and intrafield linewidth variations is investigated. The resultsindicate that (1) minimum linewidth occurs at the center offield where the optical axis intersects the mask/waler planes.(2) width ofvertical and horizontal lines increase linearly with site coordinates x and y, respectively. (3) source-mask fieldcentering errors increase the intrafield linewidth variation, (4) linewidth measurement accuracy is site-dependent because ofsloping effects that vaiy with x and y but remain constant along a column or row, and (5)currentintrafield linewidth dataanalysis techniques that utilize field-averaged statistics, contain a systematic error. thus, may not be utilized forcharacterizing linewidth control in x-ray point-source proximity printing systems.KEYWORDS: x-ray lithography, point source, exposure geometry, irradiated area, penumbra, linewidth1. INTRODUCTIONX-ray point source proximity printing (PSPP) is a lensless, near I : I image forming technique where image transfer, frommask to wafer, is based on a shadow-casting process. For a given PSPP system and mask, characteristics of the resultingaerial image, and the developed image, depend strongly on electromagnetic wave propagation, radiometric, dosimetric andsensitometric factors. These have been investigated in the past ten years by a number of distinguished authors1 ,2•Theirstudies revealed a great deal of information concerning the mechanism of image formation, microimage structure, anddiffraction effects in limiting resolution.This paper deals with the geometric aspects of x-ray PSPP. The discussion is confined to an examination of those systemcharacteristics that affect lithographic performance in terms of intrafield linewidth variation and achievable linewidthcontrol. (Analysis of geometric effects in registration and overlay will be presented in Part 2 of this paper, at a later date).The discussion is divided into four parts. First, a simplified model ofthe x-ray PSPP system is presented which defines theexposure geometry and identifies the key parameters and variables. Next, the size and location of uniformly irradiated area,and penumbra are determined. Intrafield linewidth variations that are geometry related and unique to x-ray PSPP systems,are investigated in the third part. In the last part, source-mask/field centering errors, and their contribution to intrafieldlinewidth variation, are analyzed." @default.
- W2020512676 created "2016-06-24" @default.
- W2020512676 creator A5052245557 @default.
- W2020512676 date "1995-05-19" @default.
- W2020512676 modified "2023-09-23" @default.
- W2020512676 title "Geometry of x-ray point source proximity printing, Part I: linewidth control" @default.
- W2020512676 doi "https://doi.org/10.1117/12.209174" @default.
- W2020512676 hasPublicationYear "1995" @default.
- W2020512676 type Work @default.
- W2020512676 sameAs 2020512676 @default.
- W2020512676 citedByCount "0" @default.
- W2020512676 crossrefType "proceedings-article" @default.
- W2020512676 hasAuthorship W2020512676A5052245557 @default.
- W2020512676 hasConcept C103783831 @default.
- W2020512676 hasConcept C120665830 @default.
- W2020512676 hasConcept C121332964 @default.
- W2020512676 hasConcept C142181693 @default.
- W2020512676 hasConcept C192562407 @default.
- W2020512676 hasConcept C2524010 @default.
- W2020512676 hasConcept C28719098 @default.
- W2020512676 hasConcept C33923547 @default.
- W2020512676 hasConcept C520434653 @default.
- W2020512676 hasConceptScore W2020512676C103783831 @default.
- W2020512676 hasConceptScore W2020512676C120665830 @default.
- W2020512676 hasConceptScore W2020512676C121332964 @default.
- W2020512676 hasConceptScore W2020512676C142181693 @default.
- W2020512676 hasConceptScore W2020512676C192562407 @default.
- W2020512676 hasConceptScore W2020512676C2524010 @default.
- W2020512676 hasConceptScore W2020512676C28719098 @default.
- W2020512676 hasConceptScore W2020512676C33923547 @default.
- W2020512676 hasConceptScore W2020512676C520434653 @default.
- W2020512676 hasLocation W20205126761 @default.
- W2020512676 hasOpenAccess W2020512676 @default.
- W2020512676 hasPrimaryLocation W20205126761 @default.
- W2020512676 hasRelatedWork W1963957959 @default.
- W2020512676 hasRelatedWork W1977850972 @default.
- W2020512676 hasRelatedWork W2009625705 @default.
- W2020512676 hasRelatedWork W2025982861 @default.
- W2020512676 hasRelatedWork W2027008718 @default.
- W2020512676 hasRelatedWork W2069985805 @default.
- W2020512676 hasRelatedWork W2156523833 @default.
- W2020512676 hasRelatedWork W2301875525 @default.
- W2020512676 hasRelatedWork W2358452547 @default.
- W2020512676 hasRelatedWork W2774982010 @default.
- W2020512676 hasRelatedWork W2806170654 @default.
- W2020512676 hasRelatedWork W168411957 @default.
- W2020512676 hasRelatedWork W2471536252 @default.
- W2020512676 hasRelatedWork W2515852878 @default.
- W2020512676 hasRelatedWork W2752491417 @default.
- W2020512676 hasRelatedWork W2847098748 @default.
- W2020512676 hasRelatedWork W2879236930 @default.
- W2020512676 hasRelatedWork W2929862881 @default.
- W2020512676 hasRelatedWork W3141771115 @default.
- W2020512676 hasRelatedWork W3150354192 @default.
- W2020512676 isParatext "false" @default.
- W2020512676 isRetracted "false" @default.
- W2020512676 magId "2020512676" @default.
- W2020512676 workType "article" @default.