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- W2020587243 abstract "We studied the strain introduced in a Si(111) substrate due to MeV ion implantation using extremely asymmetric x-ray diffraction and measured the rocking curves of asymmetrical 113 diffraction for the Si substrates implanted with a 1.5 MeV Au2+ ion at fluence values of 1×1013, 5×1013, and 1×1014/cm2. The measured curves consisted of a bulk peak and accompanying subpeak with an interference fringe. The positional relationship of the bulk peak to the subpeak and the intensity variation of those peaks with respect to the wavelengths of the x rays indicated that crystal lattices near the surface were strained; the lattice spacing of surface normal (111) planes near the surface was larger than that of the bulk. Detailed strain profiles along the depth direction were successfully estimated using a curve-fitting method based on Darwin’s dynamical diffraction theory. Comparing the shapes of resultant strain profiles, we found that a strain evolution rapidly occurred within a depth of ∼300 nm at fluence values between 1×1013 and 5×1013/cm2. This indicates that formation of the complex defects progressed near the surface when the fluence value went beyond a critical value between 1×1013 and 5×1013/cm2 and the defects brought a large strain to the substrate." @default.
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- W2020587243 date "2009-08-15" @default.
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- W2020587243 title "Strain evolution in Si substrate due to implantation of MeV ion observed by extremely asymmetric x-ray diffraction" @default.
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- W2020587243 doi "https://doi.org/10.1063/1.3202329" @default.
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