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- W2020685888 abstract "The non-uniformity and anisotropy of Au/Si reaction, which results in the formation of craters at the Au/Si bonding interface, are investigated. The non-uniformity of Au/Si reaction is due to the native oxide on the bare Si surface. A different interfacial morphology of Au/Si bonding is observed and explained by a proposed model. To achieve a uniform bonding interface, a Ti/Au layer is deposited onto the bare Si surface, in which the Ti layer is used to decompose the native oxide during bonding. By the proposed bonding structure, a uniform bonding interface without craters has been achieved." @default.
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- W2020685888 date "2010-01-01" @default.
- W2020685888 modified "2023-09-23" @default.
- W2020685888 title "Low-temperature Au/Si wafer bonding" @default.
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- W2020685888 doi "https://doi.org/10.1049/el.2010.1381" @default.
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