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- W2020739904 abstract "Minimum infiltration times during isothermal chemical vapor infiltration were calculated for the formation of a silicon carbide matrix composite from methyltrichlorosilane (MTS). Several different reaction models were used to describe the SiC deposition kinetics. The results show that the nature of the reaction model has a significant effect on process optimization considerations. It is clear that a simple first-order deposition reaction does not accurately describe the infiltration process, while rate expressions that treat the effect of chlorine-containing byproduct gases provide much more accurate predictions. In theory, much shorter infiltration times can be obtained with precursor chemistries that do not produce Cl-containing gases. The results also provide guidelines for minimizing infiltration times with MTS." @default.
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- W2020739904 modified "2023-09-27" @default.
- W2020739904 title "Minimizing Infiltration Times during Isothermal Chemical Vapor Infiltration with Methyltrichlorosilane" @default.
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