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• W2020748113 abstract "The use of Si(011)/Si(001) direct silicon bonding (DSB) substrates is a key element of future complementary metal-oxide-semiconductor device technology. In the conventional bonding process, it is necessary to remove interfacial SiO2 to achieve direct atomic bonding. In this study, using X-ray microdiffraction and transmission electron microscopy, we investigate the structural changes caused by oxide out-diffusion annealing (ODA). It is revealed that crystallinity of the bonded Si(011) layer is degraded after low temperature ODA and gradually recovered with an increase in the ODA temperature and annealing time, which is well correlated with the interfacial SiO 2 /Si morphology. Characteristic domain textures depending on the ODA temperature are also detected." @default.
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• W2020748113 date "2011-02-01" @default.
• W2020748113 modified "2023-10-16" @default.
• W2020748113 title "Structural Change during the Formation of Directly Bonded Silicon Substrates" @default.
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• W2020748113 doi "https://doi.org/10.4028/www.scientific.net/kem.470.158" @default.
• W2020748113 hasPublicationYear "2011" @default.
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