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- W2020753656 abstract "This study investigates the characteristics of zinc oxide (ZnO) film in a resistive random-access memory (RAM) (RRAM) with aluminum as the top and bottom electrodes. The effect of oxygen content on the electrical performance of the ZnO film is evaluated using O2/(Ar + O2) gas flow ratios of 16%, 25%, and 33%. From experimental results, the ZnO RRAMs with an oxygen-gas flow ratio of 33% reveals the lowest VRESET/VSET voltages, and high resistance ratio (∼107), but a larger variation (or outlier) appears on high-resistance state (HRS). In endurance testing, the ZnO RRAM with an oxygen-gas flow ratio of 33% shows the largest switching cycle than those with oxygen-gas flow ratios of 16% and 25%. With respect to the resistance switching mechanism, slight amorphization, lower binding energy between zinc (Zn) and oxygen (O) atoms, and optimal number of oxygen ions and/or vacancies in the ZnO film are beneficial for improving the RRAM performance. In summary, a ZnO RRAM with an oxygen-gas flow ratio of 33% and Al electrodes has the lowest VSET/VRESET voltages and the best endurance. Moreover, the ZnO RRAM reveals large resistance magnitude margin (∼102) at HRS and low resistance state (LRS)." @default.
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- W2020753656 date "2015-03-01" @default.
- W2020753656 modified "2023-10-18" @default.
- W2020753656 title "Impact of oxygen composition of ZnO metal-oxide on unipolar resistive switching characteristics of Al/ZnO/Al resistive RAM (RRAM)" @default.
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- W2020753656 doi "https://doi.org/10.1016/j.mee.2015.03.027" @default.
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