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W2021001033 abstract "Recently, there has been increasing interest in direct ablation of materials by short-pulse laser beams. Materials under study vary from thin metal films, metal and semiconductor compounds, and inorganic insulators to polymers, including human hair and photoresists. In this paper, a review of the UV laser ablation of polymers is presented. Srinivasan pioneered in the field of polymer ablation by far-UV (193-nm) pulses. Subsequently, polymer ablation with lasers at a few longer wavelengths has been reported. To date, understanding the etching mechanism and identifying the contributions from photochemical and photothermal activities continue to be the outstanding challenge. The technological issues and the material etching behavior, which varies with laser frequency, fluence, laser pulse length, and material optical absorption, will be discussed for microelectronic applications." @default.
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W2021001033 date "1986-05-01" @default.
W2021001033 modified "2023-10-04" @default.
W2021001033 title "Laser ablation of polymers" @default.
W2021001033 doi "https://doi.org/10.1116/1.573823" @default.
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