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• W2021090450 abstract "Low thermal stability of hydrogenated amorphous silicon (a-Si:H) thin films limits their widespread use for surface passivation of c-Si wafers on the rear side of solar cells. We show that thermal stability of a-Si:H surface passivation is increased significantly by a hydrogen rich a-Si:H bulk which acts as an H reservoir for the a-Si:H/c-Si interface, when a spontaneous release of H from the bulk is induced by high temperature (450°C) annealing." @default.
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• W2021090450 date "2010-06-01" @default.
• W2021090450 modified "2023-09-23" @default.
• W2021090450 title "Expanding Thermal Plasma deposited a-Si:H thin films for surface passivation of c-Si wafers" @default.
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• W2021090450 doi "https://doi.org/10.1109/pvsc.2010.5616869" @default.
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