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• W2021113518 abstract "The dependence of reflectance on the morphology of Si nanowire (SiNW) arrays was investigated. Several samples including vertically aligned NW arrays and bunched NWs were prepared by a combination of a wet etching process and two types of drying process. The optical reflectance of the NW arrays depended on the length and aggregation degree of NWs. The bunched NW arrays with high aggregation degree reduced the reflectance to less than 8% in a long visible wavelength range. It is considered that the significant reduction in the reflectance of the bunched NWs is ascribed to the combination of the macrostructure with NWs." @default.
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• W2021113518 date "2014-05-30" @default.
• W2021113518 modified "2023-09-27" @default.
• W2021113518 title "Morphology dependence of optical reflectance properties for a high-density array of silicon nanowires" @default.
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• W2021113518 doi "https://doi.org/10.7567/jjap.53.06jf10" @default.
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