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- W2021208362 abstract "Abstract Resumé Avec des films de C60, l'implantation d'ions chimiquement inertes (argon) ne produit des effets de conduction notables (σ >10−4 ω−1cm−1) liés à une dégradation, que lorsque l'échantillon est porté à haute température (560 K) durant l'irradiation; l'implantation d'argon à température ambiante ne dégénère pas le matériau (σ < 10−4ω−1cm−1), qui apparaǐt cependant dopé (σ ≈ 1 ω−1cm−1) à la suite de l'implantation à température ambiante d'ions chimiquement actifs; pour une fluence de l'ordre de 1015 ions cm−2, le pouvoir thermoélectrique apparaǐt négatif avec les ions potassium et phosphore, alors qu'il est positif avec les ions brome et bore. With C60 films, ion implantation of inert ions (argon) gives rise to conduction processes (σ > 10−4ω−1cm−1) related to degradation only in the case where implantation is performed at a high temperature (T=560 K); no sample degeneracy (σ > 10−4ω−1cm−1) appears after argon implantation at room temperature, but doping effects (σ ≈ 1ω−1cm−1) are obtained after implantation at room temerature with chemically active ions; with a fluence of the order of 1015 ions cm−2, the thermoelectric power then appears negative with potassium or phosphorus ions, and positive with bromine or boron ions." @default.
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- W2021208362 date "1994-10-01" @default.
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- W2021208362 title "Dopage de films de C60par implantation ionique (doping of C60films after ion implantation)" @default.
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- W2021208362 doi "https://doi.org/10.1080/01418639408240259" @default.
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