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• W2021502521 abstract "We report a comparative study of nano-pattern formations on a carbon film and a smooth Si(100) surface following inert and chemically active ion bombardment. For the case of carbon film, patterns could be formed both by inert (Ar+) and self (C+) ion bombardment with the former producing ripples at relatively lower fluence. In contrast, bombardment by inert Ar+ failed to form the nano patterns on Si surface, while bombardment by the same energy C+ generated the ripples. Thus, impurity induced chemical effect seems to be crucial rather than the Bradley-Harper or Carter-Vishnyakov effects for destabilizing the surface for ripple formation." @default.
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• W2021502521 date "2013-10-28" @default.
• W2021502521 modified "2023-10-18" @default.
• W2021502521 title "The role of carbon in ion beam nano-patterning of silicon" @default.
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• W2021502521 doi "https://doi.org/10.1063/1.4826512" @default.
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