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- W2021507152 abstract "Electron-beam (EB) direct writing technology using variable-shaped EB system has been developed for VLSI fabrication with 1 µm minimum linewidth. New processing program, PEBL, and new proximity correction technique, DCA, are proposed. Resist process conditions using CMS and FPM resist are studied. The successful fabrication of a 1 µm 256-kbit MOS RAM demonstrates the validity of the technology." @default.
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- W2021507152 date "1980-01-01" @default.
- W2021507152 modified "2023-09-24" @default.
- W2021507152 title "Electron-beam direct writing technology for 1 µm VLSI fabrication" @default.
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- W2021507152 doi "https://doi.org/10.1109/iedm.1980.189856" @default.
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