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- W2021679384 abstract "Microbridge materials optimized for room temperature infrared microbolometers have been fabricated using plasma enhanced chemical vapor deposition (PECVD). Thin films were deposited from tetramethyldisiloxane (TMDS) and oxygen. They have a 4× lower thermal conductivity than that of Si3N4 and an inherent absorption coefficient (8–12 μm range) approximately half that of nitride. The PECVD films deposited from TMDS are compatible with current complementary metal–oxide–semiconductor processing and have been shown to have adequate mechanical strength for use as microbolometer membranes." @default.
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- W2021679384 date "1999-05-01" @default.
- W2021679384 modified "2023-09-28" @default.
- W2021679384 title "Plasma enhanced chemically vapor deposited thin films for microelectromechanical systems applications with tailored optical, thermal, and mechanical properties" @default.
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- W2021679384 doi "https://doi.org/10.1116/1.590691" @default.
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