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- W2021726140 abstract "The influence of secondary effects on structure profiles formation process in positive and negative resists is discussed. Mathematical simulation of structure profiles in positive resists with allowance made for photoelectron exposure of boundary region is represented. Experimental results for negative resists are shown." @default.
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- W2021726140 title "Photoelectron exposure of x-ray resists" @default.
- W2021726140 doi "https://doi.org/10.1016/0167-9317(85)90073-5" @default.
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