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• W2021811998 abstract "The prototype of an infrared spectroscopic ellipsometer using a Fourier transform PC-based infrared spectrometer is described. Several applications in thin-film characterization are given, particularly in the case of bulk substrate, thick-layered materials, and determination of the dielectric function of layered materials such as silicon oxide and silicon nitride. The sensitivity and possible improvements of this technique are discussed." @default.
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• W2021811998 date "1989-10-01" @default.
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• W2021811998 title "Infrared spectroscopic ellipsometry using a Fourier transform infrared spectrometer: Some applications in thin-film characterization" @default.
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• W2021811998 doi "https://doi.org/10.1063/1.1140554" @default.
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