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- W2021936670 abstract "In this work, we present a nickel assisted electroless deposition and etching method for significant reduction of reflectivity of silicon by creating two-scale structured silicon surface. As the first step, the nano-texturization process was applied on planar Si wafers in order to optimize the process. Next, we applied this method for silicon surface with chemically prepared pyramids in order to produce a hierarchical (micron/nano) structure. We found that silicon wafers with hierarchical structure shown very low about 2.2% weighted reflection over broad wavelength range from 300 to 1100 nm, which is related with changes in surface morphology." @default.
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- W2021936670 date "2013-10-28" @default.
- W2021936670 modified "2023-09-27" @default.
- W2021936670 title "Antireflective structures on silicon surface using catalytic nickel nanoparticles" @default.
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- W2021936670 doi "https://doi.org/10.1063/1.4827838" @default.
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