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- W2021983823 abstract "Amorphous silicon films have been prepared by plasma decomposition of silane under magnetic field. The films produced at a high power and a relatively high magnetic field possess refractive indices close to the crystalline value, and exhibit no appreciable infrared absorption due to (SiH2)n or SiH3 bonds. This unique film-structure has been correlated with the high photoconductivity and low density of gap states. The growth kinetics of the film is found to be strongly influenced by magnetic field applied to discharge plasma." @default.
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- W2021983823 date "1980-01-01" @default.
- W2021983823 modified "2023-10-17" @default.
- W2021983823 title "Amorphous silicon hydrogen alloys produced under magnetic field" @default.
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- W2021983823 doi "https://doi.org/10.1016/0022-3093(80)90592-x" @default.
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