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- W2022039230 abstract "Abstract The reaction layer of a thermally reacted thin Ni film, deposited by electron-beam evaporation on a single crystalline (001) 3CSiC substrate, was investigated after vacuum annealing at 700°C in terms of its morphology and structure by cross-sectional transmission electron microscopy (TEM). Ni2Si and carbon are identified as reaction products. Distinctive dissimilarities with depth in the morphology of the reacted layer are observed. Carbon appears to form isolated clusters in the upper part of the Ni2Si layer and microcolumns in the lower part." @default.
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- W2022039230 date "1997-11-01" @default.
- W2022039230 modified "2023-10-16" @default.
- W2022039230 title "Reaction of thin Ni films with (001) 3CSiC at 700°C" @default.
- W2022039230 cites W1989732897 @default.
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- W2022039230 doi "https://doi.org/10.1016/s0167-9317(97)00156-1" @default.
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