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- W2022101044 abstract "Au ions (900 keV) have been used to directly sputter etch microstructures in silicon, aluminum, copper and silver. The results presented clearly demonstrate that high energy heavy ions can be used to fabricate microstructures in selected metals and silicon in a single step process." @default.
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- W2022101044 date "2008-07-01" @default.
- W2022101044 modified "2023-09-30" @default.
- W2022101044 title "900keV gold ion sputter etching of silicon and metals" @default.
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- W2022101044 doi "https://doi.org/10.1016/j.nimb.2008.03.229" @default.
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