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• W2022134189 abstract "Generation-three (Gen-3) immersion lithography can be an enabler for the 32nm half-pitch node. For Gen-3 lithography to be successful, however, there must be three major breakthroughs in materials development: high refractive index (high-index) lenses, high-index immersion fluids, and high-index photo-resists. Currently a material for a high-index lens element, lutetium aluminum garnet (LuAG), has been identified. However, suitable materials choices remain elusive for both the Gen-3 fluid and resist. This paper reviews the successes and failures in the search for Gen-3 high-index materials." @default.
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• W2022134189 date "2007-01-01" @default.
• W2022134189 modified "2023-10-17" @default.
• W2022134189 title "Status of High-Index Materials for Generation-Three 193nm Immersion Lithography" @default.
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• W2022134189 doi "https://doi.org/10.2494/photopolymer.20.643" @default.
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