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- W2022135135 abstract "In device integration smaller than 0.18 micrometer design rule, application of the ARC (antireflective coating) technology is unavoidable and SiON ARC and organic ARC are well-known materials up to now. In this paper, as an alternative way, new carbon ARC (CARC) material with the properties of easy stripping and good step coverage is presented. The details of its characteristics related to photo, etch and cleaning process and electrical properties after application to the real devices is investigated. The feasibility of the new CARC for both KrF and ArF lithography was confirmed." @default.
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- W2022135135 date "2001-09-14" @default.
- W2022135135 modified "2023-09-23" @default.
- W2022135135 title "Carbon antireflective coating (ARC) technology for both KrF and ArF lithography" @default.
- W2022135135 doi "https://doi.org/10.1117/12.435632" @default.
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