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• W2022165908 abstract "We propose a method for restoring the symmetry in the threshold voltage (Vth) in complementary metal-oxide-semiconductor field-effect transistors (FETs) with a Hf-based high-k dielectric. This technique is based on the Al composition adjustment in the HfAlOx(N) dielectric film to achieve the symmetric Vth. The asymmetry of ∣Vth∣ in n and p metal-oxide-semiconductor FET (MOSFETs) due to the Fermi-level pinning at the interface between the poly-Si gate electrode and Hf-based high-k dielectric is considered to be induced independently by two kinds of interfacial dipoles. The adjustment of the Al content in HfAlOx(N) enables us to balance these dipoles. Vth values of n- and p-MOSFETs are shifted in the positive direction as the Al content in HfAlOx(N) increases. Symmetrical Vth values can be obtained for poly-Si and single fully silicided nickel gate electrodes when the Al contents are about 25 and 7at.% in HfAlOx(N), respectively." @default.
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• W2022165908 date "2006-03-01" @default.
• W2022165908 modified "2023-10-16" @default.
• W2022165908 title "Symmetrical threshold voltage in complementary metal-oxide-semiconductor field-effect transistors with HfAlOx(N) achieved by adjusting Hf∕Al compositional ratio" @default.
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• W2022165908 doi "https://doi.org/10.1063/1.2178654" @default.
• W2022165908 hasPublicationYear "2006" @default.
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