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- W2022185192 abstract "Patterned octadecyltrichlorosilane (OTS) self-assembled monolayers (SAMs) was fabricated on silicon substrates, utilizing short wave UV irradiation meter (λ=184.9nm) as the photolithograph apparatus under the cover of the photomask. The patterned BiFeO 3 were prepared on the functional OTS-SAMs by sol-gel method. The characterization of the samples patterns was carried out by various techniques, including X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM) and energy disperse spectroscopy (EDS). The results indicate that the pattern BiFeO 3 thin films were successfully prepared on the functional OTS-SAMs by sol-gel method and the thin films were BiFeO 3 thin films with hexagonal perovskite distorted structure which has clear boundaries and 200µm deposited lines width." @default.
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- W2022185192 date "2012-06-01" @default.
- W2022185192 modified "2023-09-27" @default.
- W2022185192 title "Preparation of Patterned BiFeO<sub>3</sub> Thin Films on the Functional Silicon Substrates Surface" @default.
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- W2022185192 doi "https://doi.org/10.4028/www.scientific.net/kem.512-515.1731" @default.
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