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- W2022188255 abstract "Polycrystalline Si films have been grown on fused quartz plates at 500–650°C from Si 3 H 8 by thermal CVD and photo-CVD using a D 2 lamp. The thermal and photo-CVD films prepared above 575°C are highly <100 >-oriented but the films at 545 and 560°C are <110 >-oriented. This tendency is more remarkable in the photo-CVD than in the thermal CVD. These orientations change little in depth, but the orientation horizontal to the film plane is random." @default.
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- W2022188255 date "1988-04-01" @default.
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- W2022188255 title "Growth of Oriented Si Film on Quartz from Si<sub>3</sub>H<sub>8</sub> by Thermal and Photo-CVD Using a D<sub>2</sub> Lamp" @default.
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- W2022188255 doi "https://doi.org/10.1143/jjap.27.l499" @default.
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