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- W2022196364 abstract "Abstract Oxynitride film preparation via ammonolysis and ion implantation procedures was investigated. SiO 2 TiO 2 thin coatings were deposited by spinning on silicon substrates. The ammonolysis was performed at 1000°C on samples that were pretreated by (a) firing at 1000°C, (b) drying at 200°C, and (c) firing at 1000°C followed by implantation with Ar + ions. Nitrogen ion implantation was performed on (a)-type samples. The effects of the various treatments were analyzed by nuclear reaction analysis, Rutherford backscattering spectrometry, elastic recoil detection, X-ray diffraction, Fourier transformed infrared spectroscopy and X-ray photoelectron spectroscopy." @default.
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- W2022196364 date "1992-01-01" @default.
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- W2022196364 title "Nitridation of SiO2TiO2 sol-gel coatings by ammonolysis and ion implantation" @default.
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- W2022196364 doi "https://doi.org/10.1016/s0022-3093(05)80657-x" @default.
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