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Matches in SemOpenAlex for { <https://semopenalex.org/work/W2022201505> ?p ?o ?g. }

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• W2022201505 startingPage "1757" @default.
• W2022201505 abstract "We study the growth of amorphous (a-Si:H,F) and of microcrystalline (μc-Si) silicon over trench patterns in crystalline silicon substrates. We vary the conditions of the SiF4-H2 glow discharge from deposition to etching. All deposited films form lips at the trench mouth and are uniformly thick on the trench walls. Therefore, surface diffusion is not important. The results of a Monte Carlo simulation suggest that film growth is governed by a single growth species with a low (∼0.2) sticking coefficient, in combination with a highly reactive etching species." @default.
• W2022201505 created "2016-06-24" @default.
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• W2022201505 date "1990-02-15" @default.
• W2022201505 modified "2023-09-26" @default.
• W2022201505 title "Mechanism of the growth of amorphous and microcrystalline silicon from silicon tetrafluoride and hydrogen" @default.
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• W2022201505 doi "https://doi.org/10.1063/1.345600" @default.
• W2022201505 hasPublicationYear "1990" @default.
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