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• W2022218712 endingPage "1829" @default.
• W2022218712 startingPage "1816" @default.
• W2022218712 abstract "The attenuation lengths ensuremath{lambda}'s of hot electrons in thin films of epitaxial ${mathrm{CoSi}}_{2}$ on Si(100) and Si(111) were measured as a function of energy using constant-height-mode and constant-current-mode ballistic-electron-emission microscopy (BEEM). Between ensuremath{sim}1 and ensuremath{sim}3 eV above the Fermi energy, the ensuremath{lambda}'s were found to be significantly anisotropic and their energy dependencies differed strongly from the free-electron behavior. At higher energies, ${mathit{e}}^{mathrm{ensuremath{-}}mathrm{ensuremath{-}}}$${mathit{e}}^{mathrm{ensuremath{-}}}$ scattering in ${mathrm{CoSi}}_{2}$ was found to be dominant, giving a majority of the BEEM current and largely determining the spatial resolution of both forward and reverse BEEM imaging, both of which could be used for direct mapping of interfacial steps. Also, constant-height-mode BEEM was used to investigate the interfacial transport across ${mathrm{CoSi}}_{2}$/n-type Si(111), ${mathrm{CoSi}}_{2}$/p-type Si(111), and ${mathrm{CoSi}}_{2}$/n-type Si(100). Evidence for different interfacial structures of ${mathrm{CoSi}}_{2}$/Si(100) was observed." @default.
• W2022218712 created "2016-06-24" @default.
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• W2022218712 date "1995-07-15" @default.
• W2022218712 modified "2023-10-16" @default.
• W2022218712 title "Ballistic-electron-emission-microscopy investigation of hot-carrier transport in epitaxial<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML display=inline><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant=normal>CoSi</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>films on Si(100) and Si(111)" @default.
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• W2022218712 doi "https://doi.org/10.1103/physrevb.52.1816" @default.
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