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- W2022238338 abstract "IC manufacture often has to meet stringent requirements pushing the imaging tools beyond their limits. Selection and optimization of steppers used to image patterns with critical dimensions at a fraction of wavelength has to consider tool’s aberration residue and the imaging tradeoffs of the patterned features. This report presents methodology to select tool-specific, multi-feature optima for imaging tools performing beyond their design points." @default.
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- W2022238338 date "2005-05-12" @default.
- W2022238338 modified "2023-09-23" @default.
- W2022238338 title "Wavefront-based tool selection for critical level imaging" @default.
- W2022238338 doi "https://doi.org/10.1117/12.600224" @default.
- W2022238338 hasPublicationYear "2005" @default.
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