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- W2022246189 abstract "We investigate the impact of positive and negative bias temperature instability (P/NBTI) on the current degradation by using the drain current random telegraph signal ( I dRTS ) in high-κ gate dielectric and metal-gate MOSFETs. The samples were stressed at typical BTI oxide electric field (∼7 MV/cm) and I dRTS amplitude (Δ I dRTS ) distributions were measured before and after P/NBTI stress. It is shown that I dRTS degradation (Δ I dRTS / I dRTS ) in NBTI devices exhibits a wider amplitude distribution than the PBTI one. In addition, we trace trapped charge-induced saturation current I Dsat degradation in P/NBTI stress. As a result, the statistical analysis indicates that Δ I Dsat / I Dsat of the p-MOSFET is larger than Δ I Dsat / I Dsat of the n-MOSFET. Moreover, the lifetime of the device is numerically estimated based on current degradation with or without RTS. We consequently found that P/NBTI lifetime comes worse by considering the effect of RTS." @default.
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- W2022246189 date "2013-02-26" @default.
- W2022246189 modified "2023-09-23" @default.
- W2022246189 title "Investigation of Positive and Negative Bias Temperature Instability of High-κ Dielectric Metal Gate Metal–Oxide–Semiconductor-Field-Effect-Transistors by Random Telegraph Signal" @default.
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- W2022246189 doi "https://doi.org/10.7567/jjap.52.036503" @default.
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