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• W2022265211 abstract "The new reflecting optical mark is created. This mark has been received by recording of a joint power spectrum (JPS) of a transformed and reference phase masks on a chalcogenide glass As₄₀S₄₀Se₂₀. In order to fabricate the reflecting optical mark, we must choose the optimum exposure of its writing. We have offered the procedure for calculation of such exposure by using the experimental dependence of diffraction efficiency as a function of a chalcogenide glass layer exposure and the analytical equation for the JPS of two phase masks containing rectangular phase elements. This procedure includes the calculation of the correlation peak relative intensity as a function of the JPS interference pattern frequency band that is read by laser beam, and calculation of the dependence peak relative intensity versus exposure. The proposed reflecting marks allow realizing the quantitative estimation of a secured product authenticity due to producing of a correlation field and realization of the mark's identification procedure. The experimental setups based on an optical Fourier processor architecture were created for writing of reflecting optical marks and their reading and identification. The experimental examinations of dependency between a peak-to-noise ratio and exposure of a chalcogenide glass layer for the series of fabricated reflective marks were carried out. The obtained results were compared with theoretical results." @default.
• W2022265211 created "2016-06-24" @default.
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• W2022265211 date "2004-06-03" @default.
• W2022265211 modified "2023-10-18" @default.
• W2022265211 title "Study of chalcogenide-glass-based reflecting optical marks" @default.
• W2022265211 doi "https://doi.org/10.1117/12.524108" @default.
• W2022265211 hasPublicationYear "2004" @default.
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