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• W2022269099 abstract "A marker study of the lutetium silicide prepared by vacuum furnace annealing of a Lu thin layer on Si substrate shows that Si atoms are the dominant diffusing species during the formation of LuSi2−x. Rutherford backscattering spectrometry is used to determine the position of the marker before and after the annealing. The silicide films are characterized by x-ray diffraction and scanning electron microscopy." @default.
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• W2022269099 date "1991-12-15" @default.
• W2022269099 modified "2023-10-18" @default.
• W2022269099 title "Diffusion marker experiments with rare-earth silicides: The case of lutetium silicide" @default.
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• W2022269099 doi "https://doi.org/10.1063/1.349719" @default.
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