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• W2022289032 endingPage "8418" @default.
• W2022289032 startingPage "8418" @default.
• W2022289032 abstract "Mechanically hard amorphous carbon nitride films were prepared by a combination of radio frequency (RF) bias voltage applied to a substrate and chemical vapor deposition using a decomposition reaction of BrCN with a microwave discharge flow of Ar. A pulsed operation of the negative RF bias voltage (- V RF ) was applied to avoid excess sputtering of the film. The [N]/([N]+[C]) ratios of the films were ≈0.5 irrespective of the application of - V RF . The maximum hardness was 36±10 GPa for the film obtained under the conditions of - V RF =100 V, a pulse period of 1000 s, and a pulse-on time of 800 s. According to the IR spectra, the intensity of the stretching vibration of the C–N bond was increased by the application of - V RF . The Raman spectra showed increases in the relative intensity and width of the D-band. From these observations, the mechanism of film hardening when - V RF is applied was discussed." @default.
• W2022289032 created "2016-06-24" @default.
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• W2022289032 date "2006-10-01" @default.
• W2022289032 modified "2023-09-26" @default.
• W2022289032 title "Deposition of Mechanically Hard Amorphous Carbon Nitride Films with High [N]/([N]+[C]) Ratio" @default.
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• W2022289032 doi "https://doi.org/10.1143/jjap.45.8418" @default.
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