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• W2022302760 abstract "Teflon PFA (polytetrafluoroethylene-co-perfluoroalkoxy vinyl ether) was treated by a low-pressure microwave (2.45 GHz) plasma in O2, N2, H2, He and their mixtures. X-ray photoelectron spectroscopy measurements showed ablation of fluorine and incorporation of new O- and N-containing groups into the surface. Among the different gases, H2 is the most efficient for defluorination, N2 + H2 for surface functionalization, while O2 showed the least performance for both effects. Plasma treatments using N2 + H2 and O2 + H2 resulted in intermediate defluorination, i.e. between those in the pure gases, and sequential treatment by He/(N2 + H2) showed an additive effect of He and N2 + H2 alone. Angle-resolved XPS measurements revealed a pronounced gradient in the near-surface composition following H2, N2 + H2 and He/(N2 + H2) plasma treatments, in contrast to a more uniform depth distribution upon O2, N2 and He exposures. The surface modification of Teflon PFA leads to an enhanced adhesion of metals such as Cu, Ag and Au." @default.
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• W2022302760 date "1995-02-01" @default.
• W2022302760 modified "2023-10-13" @default.
• W2022302760 title "Angle-resolved XPS study of plasma-treated teflon PFA surfaces" @default.
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• W2022302760 doi "https://doi.org/10.1002/sia.740230209" @default.
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