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- W2022338141 abstract "Self-assembled GeSiC dots stacked on a Ge hut-cluster layer buried in Si have been investigated. The critical thickness for formation of GeSiC dots is reduced owing to the strain fields from the buried hut-clusters. By utilizing the stacked structure, the dot size is decreased and the uniformity is improved. The highest density of the GeSiC dots with stacked structures is 7.4×1010cm−2, which is six times larger than that of single GeSiC dots. The formation of the self-assembled GeSiC dots is strongly influenced by being stacked with buried Ge dots as well as C incorporation." @default.
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- W2022338141 date "2004-03-01" @default.
- W2022338141 modified "2023-10-09" @default.
- W2022338141 title "Small and high-density GeSiC dots stacked on buried Ge hut-clusters in Si" @default.
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- W2022338141 doi "https://doi.org/10.1016/j.physe.2003.11.056" @default.
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