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- W2022356560 abstract "In high power pulse magnetron sputtering (HPPMS), a high ionisation of the sputtered material can be obtained. We applied HPPMS to deposit TiO2 optical thin films. Material and process properties are discussed." @default.
- W2022356560 created "2016-06-24" @default.
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- W2022356560 date "2007-01-01" @default.
- W2022356560 modified "2023-09-27" @default.
- W2022356560 title "High Power Pulse Magnetron Sputtering: A New Process for Industrial High Quality Optical Coatings?" @default.
- W2022356560 doi "https://doi.org/10.1364/oic.2007.mb7" @default.
- W2022356560 hasPublicationYear "2007" @default.
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