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• W2022367998 abstract "Niobium nitride films with a value for Tc of up to 17.3 K have been prepared by reactive magnetron and diode sputtering in Ar and N2 gas mixture. Alteration of Tc and N2 ion implantation into NbN films was studied. It is shown that small doses of implanted ions cause an abrupt decrease of Tc to 12.8 K. Annealing at 900°C restores the high Tc By the tunnel effect, the magnitude of the energy gap is 3.05 Me V at 1.56 K for NbN with Tc = 17.1 K and 2†/kTc = 4.14. The existence of an undersurface layer has been discovered, whose width is of the order of the coherence length, with a lower Tc, of 12.0–12.8 K. The superconductivity of this layer above Tc is due to the proximity effect. NbN tunnel junctions are made with a density of the Josephson current i=(1.7-2.87) · 103 A cm−2." @default.
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• W2022367998 date "1983-05-01" @default.
• W2022367998 modified "2023-10-18" @default.
• W2022367998 title "Investigation of the properties of superconducting niobium nitride films" @default.
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• W2022367998 doi "https://doi.org/10.1016/0011-2275(83)90146-7" @default.
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